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MBE生长InGaAs/GaAs(001)多层矩阵式量子点(2)


(e) 9ML
○A衬底温度升高
[110][110]
200nm
○BInGaAs量增加
 2D-3D转变后立即发生3D-2D转变。在此后的周期生长中,当InGaAs沉积到4.5ML左右发生2D-3D转变,为发生3D-2D立即变化的过程。当单层InGaAs的量为6.5ML时,量子130 点个体变得均匀,个体间间隔明显,整体呈现矩阵式分布。当单层InGaAs的量为9ML时,由于各层InGaAs的量偏多,在此特定温度下,由于退火时间不足,量子点之间的相互吸收还没能充分完成,导致最终密度偏大。对于通过源中断垂直堆垛方式形成的多周期量子点结构,在一定条件下可使得量子点呈现规则的矩阵分布,而且个体尺寸均匀。 135
3 结论
本文利用MBE设备,采用间歇式源中断方式垂直堆垛In0.43Ga0.57As/GaAs(001),首次在GaAs(001)面上获得尺寸均匀且呈矩阵式均匀分布的InGaAs量子点DWELL结构。经研究发现要使自组装量子点发生充分耦合,退火工艺必不可少;当生长过程接近In脱附温度时,个体量子点不再是圆形,变得有方向性;InGaAs的量越多,量子点的密度也就越大。 140
[参考文献] (References)
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